GB/T 3656-1983
Replaced
GB/T 39145-2020
Active
National standards
GB/T 39145-2020 Test method for the content of surface metal elements on silicon wafers—Inductively coupled plasma mass spectrometry
GB/T 39145-2020 Test method for the content of surface metal elements on silicon wafers—Inductively coupled plasma mass spectrometry
Basic Information
Standard Code:
GB/T 39145-2020
Standard Type:
National standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
Analysis methods for semi-metallic and semiconductor materials
ICS Name:
\nMetal material testing
Publish Date:
2020-10-11
Implement Date:
2021-09-01
Publisher:
国家市场监督管理总局、国家标准化管理委员会
Technical Committee:
全国半导体设备和材料标准化技术委员会(SAC/TC 203)、全国半导体设备和材料标准化技术委员会材料分技术委员会(SAC/TC 203/SC 2)
Pages:
8 pages
Scope
本标准规定了电感耦合等离子体质谱法测定硅片表面金属元素含量的方法。
本标准适用于硅单晶抛光片和硅外延片表面痕量金属钠、镁、铝、钾、钙、铬、锰、铁、钴、镍、铜、锌元素含量的测定，测定范围为108 cm-2～1013 cm-2。本标准同时也适用于硅退火片、硅扩散片等无图形硅片表面痕量金属元素含量的测定。
注:硅片表面的金属元素含量以每平方厘米的原子数计。
Development Information
Drafting Units:
南京国盛电子有限公司、有研半导体材料有限公司、浙江金瑞泓科技股份有限公司、上海合晶硅材料有限公司、有色金属技术经济研究院、无锡华瑛微电子技术有限公司、龙腾半导体有限公司、厦门科鑫电子有限公司
Drafting Persons:
骆红、潘文宾、赵而敬、孙燕、张海英、徐新华、温子瑛、胡金枝、李素青、马林宝、李俊需
Referenced Standards
GB/T 25915.1-2010 Cleanrooms and associated controlled environments—Part 1:Classification of air cleanliness
SEMI F63
GB/T 6624-1995 Standard method for measuring the surface quality of polished silicon slices by visual inspection
GB/T 6624-2009 Standard method for measuring the surface quality of polished silicon slices by visual inspection
GB/T 14264-1993 Semiconductor materials—Terms and definitions
GB/T 14264-2009 Semiconductor materials—Terms and definitions
GB/T 14264-2024 Terminology of semiconductor materials
GB/T 17433-1998 Foundation terms for chemical analysis of metallurgical products
GB/T 17433-2014 Foundation terms for chemical analysis of metallurgical products
GB/T 19921-2005 Test method of particles on silicon wafer surfaces
GB/T 19921-2018 Test method for particles on polished silicon wafer surfaces
GB/T 37837-2019 General rules for quadrupole inductively coupled plasma mass spectrometry
JJF 1159-2006 Calibration Specification for Quadrupole Inductively Coupled Plasma Mass Spectrometers
Related Standards
GB/T 3657-1983
Replaced
GB/T 3657-1983 Measurement method of direct magnetic properties of soft magnetic alloys
GB/T 3849-1983
Replaced
GB/T 3849-1983 Hardmetals—Rockwell hardness (scale A) test method
GB/T 3850-1983
Replaced
GB/T 3850-1983 Impermeable sintered metal materials and hardmetals—determination of density
GB/T 3851-1983
Replaced
GB/T 3851-1983 Hardmetals—determination of transverse rupture strength
GB/T 4326-1984
Replaced