DZ/T 0101.12-1994
Active
SJ 21443-2018
Active
Industry standards-Electronics
SJ 21443-2018 Specification for low resisfance gallium nitridemonocrystalline wafers of GaN-N
SJ 21443-2018 Specification for low resisfance gallium nitridemonocrystalline wafers of GaN-N
Price:
$ 30
Basic Information
Standard Code:
SJ 21443-2018
Standard Type:
Industry standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
-
ICS Name:
-
Publish Date:
2018-01-18
Implement Date:
2018-05-01
Pages:
12 pages
Scope
This specification stipulates the requirements, quality assurance provisions, and delivery preparations for GaN-N-type low-resistance gallium nitride single crystals.
Development Information
Referenced Standards
GB/T 11073-2007 Standard method for measuring radial resistivity variation on silicon slices
GB/T 13387-1992 Test method for measuring flat length on slices of electronic materials
GB/T 13387-2009 Test method for measuring flat length wafers of silicon and other electronic materials
GB/T 13388-1992 Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques
GB/T 13388-2009 Method for measuring crystallographic orientation of flats on single-crystal silicon slices and wafers by X-ray techniques
GB/T 1555-2009 Testing methods for determining the orientation of a semiconductor single crystal
GB/T 191-2000 Packaging—Pictorial marking for handling of goods
GB/T 191-2008 Packaging—Pictorial marking for handling of goods
GB/T 30867-2014 Test method for measuring thickness and total thickness variation of monocrystalline silicon carbide wafers
GB/T 32188-2015 Test method for full width at half maximum of double crystal X-ray rocking curve of GaN single crystal substrate
GB/T 32189-2015 Test method for surface roughness of GaN single crystal substrate by atomic force microscope
GB/T 32278-2015 Test method for flatness of monocrystalline silicon carbide wafers
GB/T 32282-2015 Test method for dislocation density of GaN single crystal—Cathodoluminescence spectroscopy
GB/T 4326-2006 Extrinsic semiconductor single crystals measurement of Hall mobility and Hall coefficient
GB/T 6616-2009 Test methods for measuring resistivity of semiconductor wafers or sheet resistance of semiconductor films with a noncontact eddy-current gauge
GB/T 6624-1995 Standard method for measuring the surface quality of polished silicon slices by visual inspection
GB/T 6624-2009 Standard method for measuring the surface quality of polished silicon slices by visual inspection
GJB 179A-1996
GB/T 191-2025 Graphical symbols marking for handling and storage of packages
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