SJ 21443-2018 Active Industry standards-Electronics

SJ 21443-2018 Specification for low resisfance gallium nitridemonocrystalline wafers of GaN-N

SJ 21443-2018 Specification for low resisfance gallium nitridemonocrystalline wafers of GaN-N

Publish Date: 2018-01-18 Implement Date: 2018-05-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us
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Basic Information

Standard Code: SJ 21443-2018
Standard Type: Industry standards
Standard Status: Active
is_force_gb: no
CCS Name: -
ICS Name: -
Publish Date: 2018-01-18
Implement Date: 2018-05-01
Pages: 12 pages

Scope

This specification stipulates the requirements, quality assurance provisions, and delivery preparations for GaN-N-type low-resistance gallium nitride single crystals.

Development Information

Pages: 12 pages

Referenced Standards

GB/T 11073-2007 Standard method for measuring radial resistivity variation on silicon slices GB/T 13387-1992 Test method for measuring flat length on slices of electronic materials GB/T 13387-2009 Test method for measuring flat length wafers of silicon and other electronic materials GB/T 13388-1992 Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques GB/T 13388-2009 Method for measuring crystallographic orientation of flats on single-crystal silicon slices and wafers by X-ray techniques GB/T 1555-2009 Testing methods for determining the orientation of a semiconductor single crystal GB/T 191-2000 Packaging—Pictorial marking for handling of goods GB/T 191-2008 Packaging—Pictorial marking for handling of goods GB/T 30867-2014 Test method for measuring thickness and total thickness variation of monocrystalline silicon carbide wafers GB/T 32188-2015 Test method for full width at half maximum of double crystal X-ray rocking curve of GaN single crystal substrate GB/T 32189-2015 Test method for surface roughness of GaN single crystal substrate by atomic force microscope GB/T 32278-2015 Test method for flatness of monocrystalline silicon carbide wafers GB/T 32282-2015 Test method for dislocation density of GaN single crystal—Cathodoluminescence spectroscopy GB/T 4326-2006 Extrinsic semiconductor single crystals measurement of Hall mobility and Hall coefficient GB/T 6616-2009 Test methods for measuring resistivity of semiconductor wafers or sheet resistance of semiconductor films with a noncontact eddy-current gauge GB/T 6624-1995 Standard method for measuring the surface quality of polished silicon slices by visual inspection GB/T 6624-2009 Standard method for measuring the surface quality of polished silicon slices by visual inspection GJB 179A-1996 GB/T 191-2025 Graphical symbols marking for handling and storage of packages

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