GB/T 11093-1989
Replaced
GB/T 11094-2020
Active
National standards
GB/T 11094-2020 Gallium arsenide single crystal and cutting wafer grown by horizontal bridgman method
GB/T 11094-2020 Gallium arsenide single crystal and cutting wafer grown by horizontal bridgman method
Basic Information
Standard Code:
GB/T 11094-2020
Standard Type:
National standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
Compound semiconductor materials
ICS Name:
Semiconductor materials
Publish Date:
2020-09-29
Implement Date:
2021-08-01
Pages:
11 pages
Scope
This standard specifies the grades and classification, requirements, test methods, inspection rules, marking, packaging, transportation, storage, quality certificates, and order forms (or contracts) of GaAs single crystals (hereinafter referred to as GaAs single crystals) and cut pieces.
This standard is applicable to GaAs single crystals and cut pieces used in optoelectronic devices, sensing elements, and other applications.
Development Information
Replace the following standards
Referenced Standards
GB/T 2828.1-2012 Sampling procedures for inspection by attributes—Part 1:Sampling schemes indexed by acceptance quality limit(AQL) for lot-by-lot inspection
GB/T 1555-1997 Test methods for determining the orientation of a semiconductor single crystal
GB/T 1555-2009 Testing methods for determining the orientation of a semiconductor single crystal
GB/T 1555-2023 Test methods for determining the orientation of a semiconductive single crystal
GB/T 4326-1984 Extrinsic semiconductor single crystals—measurement of Hall mobility and Hall coefficient
GB/T 4326-2006 Extrinsic semiconductor single crystals measurement of Hall mobility and Hall coefficient
GB/T 8760-1988 Gallium arsenide single crystal—Determination of dislocation density
GB/T 8760-2006 Gallium arsenide single crystal—Determination of dislocation density
GB/T 8760-2020 Test method for dislocation density of monocrystal gallium arsenide
GB/T 13388-1992 Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques
GB/T 13388-2009 Method for measuring crystallographic orientation of flats on single-crystal silicon slices and wafers by X-ray techniques
GB/T 14264-1993 Semiconductor materials—Terms and definitions
GB/T 14264-2009 Semiconductor materials—Terms and definitions
GB/T 14264-2024 Terminology of semiconductor materials
GB/T 14844-1993 Designations of semiconductor materials
GB/T 14844-2018 Designations of semiconductor materials
GB/T 4326-2025 Extrinsic semiconductor single crystals measurement of Hall mobility and Hall coefficient
Related Standards
GB/T 13388-1992
Replaced
GB/T 13388-1992 Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques
GB/T 13389-1992
Replaced
GB/T 13389-1992 Practice for conversion between resistivity and dopant density for boron-doped and phosphorus-doped silicon
GB/T 13843-1992
Abolished
GB/T 13843-1992 Polished monocrystalline sapphire substrates
GB/T 14015-1992
Active
GB/T 14015-1992 Silicon on sapphire epitaxial wafers
GB/T 14139-1993
Replaced