GB/T 46611-2025 Lithium niobate single-crystal thin film for electro-optic modulator

GB/T 191-2008 Packaging—Pictorial marking for handling of goods GB/T 1185-2006 Surface imperfections of optical elements GB/T 1551-1995 Test method for resistivity of silicon and germanium bars using a two-point probe GB/T 1551-2009 Test method for measuring resistivity of monocrystal silicon GB/T 1551-2021 Test method for measuring resistivity of monocrystal silicon—In-line four-point probe and direct current two-point probe method GB/T 2828.1-2012 Sampling procedures for inspection by attributes—Part 1:Sampling schemes indexed by acceptance quality limit(AQL) for lot-by-lot inspection GB/T 6618-1995 Test method for thickness and total thickness variation of silicon slices GB/T 6618-2009 Test method for thickness and total thickness variation of silicon slices GB/T 6619-1995 Test methods for bow of silicon slices GB/T 6619-2009 Test methods for bow of silicon wafers GB/T 14264-1993 Semiconductor materials—Terms and definitions GB/T 14264-2009 Semiconductor materials—Terms and definitions GB/T 14264-2024 Terminology of semiconductor materials GB/T 20919-2007 External micrometer with electronic digital display GB/T 20919-2018 External micrometer with electronic digital display GB/T 25915.1-2021 Cleanrooms and associated controlled environments—Part 1:Classification of air cleanliness by particle concentration GB/T 29505-2013 Test method for measuring surface roughness on planar surfaces of silicon wafer GB/T 30118-2013 Single crystal wafers for surface acoustic wave(SAW) device applications—Specifications and measuring methods GB/T 30857-2014 Standard test method for thickness and thickness variation on sapphire substrates GB/T 40279-2021 Test method for thickness of films on silicon wafer surface—Optical reflection method GB/T 41853-2022 Semiconductor devices—Micro-electromechanical devices—Wafer to wafer bonding strength measurement