GB/T 30656-2023 Active National standards

GB/T 30656-2023 Polished monocrystalline silicon carbide wafers

GB/T 30656-2023 Polished monocrystalline silicon carbide wafers

Publish Date: 2023-03-17 Implement Date: 2023-10-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us
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Basic Information

Standard Code: GB/T 30656-2023
Standard Type: National standards
Standard Status: Active
is_force_gb: no
CCS Name: Compound semiconductor materials
ICS Name: Semiconductor materials
Publish Date: 2023-03-17
Implement Date: 2023-10-01
Pages: 16 pages

Scope

This document specifies the grades and classification, technical requirements, test methods, inspection rules, marking, packaging, transportation, storage, accompanying documents, and order form content of 4H and 6H silicon carbide single-crystal wafers. This document is applicable to silicon carbide single-crystal wafers used as epitaxial materials for the production of power electronics devices, radio frequency and microwave devices, and LED lighting devices.

Development Information

Word Count: 34 Thousand words Pages: 16 pages

Replace the following standards

Referenced Standards

GB/T 2828.1-2012 Sampling procedures for inspection by attributes—Part 1:Sampling schemes indexed by acceptance quality limit(AQL) for lot-by-lot inspection GB/T 25915.1-2021 Cleanrooms and associated controlled environments—Part 1:Classification of air cleanliness by particle concentration GB/T 1555-1997 Test methods for determining the orientation of a semiconductor single crystal GB/T 1555-2009 Testing methods for determining the orientation of a semiconductor single crystal GB/T 1555-2023 Test methods for determining the orientation of a semiconductive single crystal GB/T 6616-1995 Test method for measuring resistivity of semiconductor silicon or sheet resistance of semiconductor films with a noncontact eddy-current gage GB/T 6616-2009 Test methods for measuring resistivity of semiconductor wafers or sheet resistance of semiconductor films with a noncontact eddy-current gauge GB/T 6616-2023 Test method for resistivity of semiconductor wafers and sheet resistance of semiconductor films—Noncontact eddy-current gauge GB/T 6624-1995 Standard method for measuring the surface quality of polished silicon slices by visual inspection GB/T 6624-2009 Standard method for measuring the surface quality of polished silicon slices by visual inspection GB/T 13387-1992 Test method for measuring flat length on slices of electronic materials GB/T 13387-2009 Test method for measuring flat length wafers of silicon and other electronic materials GB/T 13388-1992 Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques GB/T 13388-2009 Method for measuring crystallographic orientation of flats on single-crystal silicon slices and wafers by X-ray techniques GB/T 14264-1993 Semiconductor materials—Terms and definitions GB/T 14264-2009 Semiconductor materials—Terms and definitions GB/T 14264-2024 Terminology of semiconductor materials GB/T 26067-2010 Standard test method for dimensions of notches on silicon wafers GB/T 29505-2013 Test method for measuring surface roughness on planar surfaces of silicon wafer GB/T 30866-2014 Test method for measuring diameter of monocrystalline silicon carbide wafers GB/T 30867-2014 Test method for measuring thickness and total thickness variation of monocrystalline silicon carbide wafers GB/T 31351-2014 Nondestructive test method for micropipe density of polished monocrystalline silicon carbide wafers GB/T 32188-2015 Test method for full width at half maximum of double crystal X-ray rocking curve of GaN single crystal substrate GB/T 32278-2015 Test method for flatness of monocrystalline silicon carbide wafers GB/T 42271-2022 Test method for resistivity of semi-insulating monocrystalline silicon carbide by contactless measurement GB/T 41765-2022 Test method for dislocation density of monocrystalline silicon carbide GB/T 32278-2025 Test method for thickness and fltaness of monocrystalline silicon carbide wafers

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